Structural, Optical and Electrical Properties of R-Tio2:Sn/sno2:(f/nb) Tandem Film by Aerosol-Assisted Chemical Vapor Deposition

Likun Wang,Jingkai Yang,Hongli Zhao,Yong Liu,Gaorong Han,Jianxun Wang
DOI: https://doi.org/10.1016/j.surfin.2022.102196
IF: 6.2
2022-01-01
Surfaces and Interfaces
Abstract:A novel F and Nb co-doped SnO2 thin film with a rutile TiO2:Sn buffer layer (r-TTO/NFTO) was obtained using an aerosol-assisted chemical vapor deposition, and its micro-nano interface structure, electrical and optical prop-erties were studied in detail. Due to the little lattice mismatch between the interfaces of NFTO and r-TTO layers as well as the synergistic enhancement effect of F and Nb co-doping, the tandem film shows an improved crystallinity with minimum residual stress and fewer planar defects. The heterogeneous structure formed be-tween r-TTO and NFTO is conducive to the transfer of electrons in TiO2 to NFTO, increasing the carrier con-centration of NFTO film. Compared with FTO film, both of the carrier concentration and Hall mobility were obviously improved, the sheet resistance (5 omega/) and resistivity (2.82 x 10-4 omega cm) were reduced by 40% and 37%, respectively. Particularly, an extremely low emissivity of 0.08 was obtained, which is the lowest value for hard coatings to our knowledge.
What problem does this paper attempt to address?