Experimental Demonstration of an Ultra-Fast Double Gate Inversion Layer Emitter Transistor (DG-ILET)

F Udrea,UNK Udugampola,K Sheng,RA McMahon,GAJ Amaratunga,EMS Narayanan,MM De Souza,S Hardikar
DOI: https://doi.org/10.1109/led.2002.805757
IF: 4.8157
2002-01-01
IEEE Electron Device Letters
Abstract:In this letter we demonstrate experimentally a novel ultra-fast power device structure termed the double gate inversion layer emitter transistor (DG-ILET). The device is made in HV CMOS technology and its operation is based on a new physical injection mechanism previously reported and demonstrated experimentally (Udrea et al., 1996), namely the use of a MOS inversion layer as a minority carrier injector. The DG-ILET offers very fast turn-off associated with anode shorted lateral IGBT structures and low on-state voltage drop similar to standard lateral IGBTs without anode shorts. Unlike anode shorted structures, the DG-ILET does not exhibit a long, undesirable on-state snapback.
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