Investigation on minority carrier lifetime, diffusion length and recombination mechanism of Mg-doped GaN grown by MOCVD
Jing Wang,Xiaodan Wang,Jiafan Chen,Xiaodong Gao,Xionghui Zeng,Hongmin Mao,Ke Xu
DOI: https://doi.org/10.1016/j.jallcom.2021.159477
IF: 6.2
2021-07-01
Journal of Alloys and Compounds
Abstract:<p>Minority carrier lifetime and diffusion length are important parameters for GaN based material and devices. In this work, we obtained the minority carrier lifetime and diffusion length of p-GaN through the photoluminescence lifetime of the band edge peak, and analyzed the recombination behavior of carriers. Besides, the dependence of photoluminescence lifetime of GaN: Mg grown by MOCVD on annealing temperature (T<sub>A</sub>) and Mg concentration ([Mg]) has been investigated through Time-resolved Photoluminescence (TRPL) measurements. We increased the activated Mg acceptors ratio by increasing T<sub>A</sub>, analyzed the fast and slow decay of carrier recombination, and compared the effects of annealing on the lifetime of GaN band-edge emission with different Mg concentrations. And it is found that the minority carrier lifetime in p-GaN is not only related to Mg concentration, but also related to the activated Mg acceptors concentration / hole concentration. Meanwhile, we compared heteroepitaxial p-GaN with homoepitaxial p-GaN, and further analyzed the influence of dislocation as non-radiative recombination centers (NRCs) on carrier lifetime and recombination behavior.</p>
materials science, multidisciplinary,chemistry, physical,metallurgy & metallurgical engineering