Resolving The Evolution Of Atomic Layer-Deposited Thin-Film Growth By Continuous In Situ X-Ray Absorption Spectroscopy
Xiaohui Qu,Danhua Yan,Ruoshui Li,Jiajie Cen,Chenyu Zhou,Wenrui Zhang,Deyu Lu,Klaus Attenkofer,Dario J. Stacchiola,Mark S. Hybertsen,Eli Stavitski,Mingzhao Liu
DOI: https://doi.org/10.1021/acs.chemmater.0c04547
IF: 10.508
2021-01-01
Chemistry of Materials
Abstract:In situ synchrotron X-ray absorption near-edge structure characterization of thin-film titania growth by atomic layer deposition (ALD) over ZnO nanowires reveals persistent low-coordinated Ti motifs leading to a new picture of ALD growth. Through the design of growth and measurement cycles, Ti K-edge spectral data are continuously recorded so as to characterize the film evolution as a function of ALD cycle number and the surface changes within the time scale of the ALD cycle. A unified set of analysis tools is developed to interpret the time-series of spectral data. A prenucleation stage of growth, a transition region, and then a steady-state growth stage are observed with distinguishable features. Multivariate curve resolution analysis, that is physically constrained, demonstrates two specific spectral components with associated, time-dependent concentrations. The bulk-film component tracks the stages of growth. The surface and interface components, present throughout the stages of growth, reveal a significant coverage of relatively isolated or loosely networked tetrahedrally coordinated Ti atomic motifs. Finally, spectral signatures for the intra-cycle growth kinetics are reconstructed at a time resolution of similar to 1 s and demonstrate that the transient Ti motifs on the growing surface stabilize within a few seconds of the Ti precursor pulse.