Aluminum Doping and Dielectric Properties of Silicon Carbide by CVD

Li Zhi-min,Su Xiao-lei,Luo Fa,Zhu Dong-mei,Zhou Wan-cheng
IF: 3.752
2007-01-01
Transactions of Nonferrous Metals Society of China
Abstract:Cubic beta-SiC coating was grown onto the graphite substrate by the normal pressure chemical vapor deposition using CH3SiCl3 (MTS) as a source precursor at 1 150 degrees C. But the hexagonal Al4SiC4 phase was generated in the doped process with trimethylaluminium (TMA) as the dopant. Microstructure of the deposit coating as-prepared was characterized by scanning electron microscope (SEM), which consists of spherical particles with a very dense facet structure. The real component of permittivity epsilon ' and dielectric loss tan delta of the coatings undoped and doped by TMA were carried out by a vector network analyzer in the microwave frequency ranges from 8.2 GHz to 12.4 GHz. The results show that both of them have low values, and doped coating has lower epsilon ' and tan 6 than undoped one due to the existence of Al4SiC4 impurity phase, which indicates that the desired Al/SiC solid solution at 1 150 degrees C in a normal argon atmosphere is not produced.
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