CMOS-Compatible Micromachined Edge-Suspended Spiral Inductors With High Q-Factors and Self-Resonance Frequencies

K. J. Chen,W. C. Hon,J. Zhang,L. L. W. Leung
DOI: https://doi.org/10.1109/LED.2004.829004
IF: 4.8157
2004-01-01
IEEE Electron Device Letters
Abstract:This paper reports a new category of high-Q edge-suspended inductors (ESI) that are fabricated using CMOS-compatible micromachining techniques. This structure was designed based on the concept that the current was crowded at the edges of the conducting metal wires at high frequencies due to the proximity effect. The substrate coupling and loss can be effectively suppressed by removing the silicon ...
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