Plasma-Enhanced Low Temperature Growth of Silicon Nanowires and Hierarchical Structures by Using Tin and Indium Catalysts

Linwei Yu,Benedict O'Donnell,Pierre-Jean Alet,S. Conesa-Boj,F. Peiro,J. Arbiol,Pere Roca i Cabarrocas
DOI: https://doi.org/10.1088/0957-4484/20/22/225604
IF: 3.5
2009-01-01
Nanotechnology
Abstract:Plasma-enhanced low temperature growth (<300 degrees C) of silicon nanowires (SiNWs) and hierarchical structures via a vapor-liquid-solid (VLS) mechanism are investigated. The SiNWs were grown using tin and indium as catalysts prepared by in situ H-2 plasma reduction of SnO2 and ITO substrates, respectively. Effective growth of SiNWs at temperatures as low as 240 degrees C have been achieved, while tin is found to be more ideal than indium in achieving a better size and density control of the SiNWs. Ultra-thin (4-8 nm) silica nanowires, sprouting from the dendritic nucleation patterns on the catalyst's surface, were also observed to form during the cooling process. A kinetic growth model has been proposed to account for their formation mechanism. This hierarchical structure combines the advantages of the size and position controllability from the catalyst-on-top VLS-SiNWs and the ultra-thin size from the catalyst-on-bottom VLS-ScNWs.
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