Abstract:Thin film deposition from vapor with adsorbate diffusion and Ehrlich-Schwoebel (ES) barriers at step edges is studied by kinetic Monte Carlo (KMC) simulations and scaling approaches. Mound coarsening with slope selection is shown at the largest thicknesses, where roughness ( W ) and correlation length ( ξ ) scale in time with exponents β≈n≈0.25 , consistently with theoretical works but contrasting with previous simulations that systematically showed temperature-dependent exponents. At a given film thickness, we show that the mounded morphology is independent of the ES barrier, so that interlayer transport is suppressed, while the temperature increase of W and ξ is consistent with intralayer transport limited by adatom detachment from flat terrace borders. Initial layer-by-layer (LBL) growth occurs above a characteristic temperature that increases with the activation energies of terrace diffusion and of ES barrier, but weakly depends on the external flux. Subsequently, as the surface roughness is near the atom/molecule size, there is rapid roughening where, counterintuitively, larger effective growth exponents ( β>0.5 , suggesting unstable growth) are correlated with longer LBL regimes. Similar LBL-rough transitions were reported in organic film deposition and the model application to diindenoperylene films suggests a large ES barrier ∼0.4eV . In the mound coarsening regime, W/ξ and θ1/2/Wξ converge to constant values dependent on surface diffusion coefficients ( θ is the film thickness). This convergence suggests mound coarsening with slope selection in SnTe films whose effective β is anomalously large, showing how film morphology can be interpreted beyond exponent measurements.

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