Abstract:The corrosion inhibition properties of trithiocyanuric acid (TTCA) self-assembled monolayers (SAMs) on copper surfaces in hydrochloric acid have been investigated by electrochemical impedance spectroscopy, potentiodynamic polarisation and cyclic voltammetry methods. These results show that TTCA SAMs could keep the long term stability and provide a better corrosion protection for copper in acidic solution. The high quality SAMs depend mainly on the TTCA concentration and suitable self-assembly time. Fourier transform infrared spectroscopy, contact angle and SEM measurements reveal that TTCA is liable to interact with copper forming SAMs and produces a hydrophilic surface with an orderly layer structure. The adsorption behaviour of TTCA follows the Langmuir isotherm. Quantum chemical calculations show that the sulphur and nitrogen atoms act as the main active sites, and the small energy gap Delta E between the highest occupied molecular orbital and the lowest unoccupied molecular orbital and the low dipole moment m favour the adsorption of TTCA on the copper surface.

Inhibition of copper corrosion by self-assembled monolayers of triazole derivative in chloride-containing solution

Inhibition Effect of 2,4,6-Trimercapto-1,3,5-triazine Self-Assembled Monolayers on Copper Corrosion in NaCl Solution

Corrosion Protection of Copper by Self-Assembled Monolayers Modified in Aqueous Micellar Solution

Corrosion Inhibition of Copper in Hydrochloric Acid by Coverage with Trithiocyanuric Acid Self-Assembled Monolayers

Protection of Copper Corrosion by Modification of Dodecanethiol Self-Assembled Monolayers Prepared in Aqueous Micellar Solution

Inhibition of Copper Corrosion by Modifying Cysteine Self‐assembled Film with Alkylamine/alkylacid Compounds

Electrochemical and Anti-Corrosion Properties of Octadecanethiol and Benzotriazole Binary Self-Assembled Monolayers on Copper

Studies on corrosion inhibition of copper by alkanethiol SAMs prepared in aqueous micellar solution

Protection of Copper Corrosion in 0.5 M Nacl Solution by Modification of 5-Mercapto-3-phenyl-1,3,4-thiadiazole-2-thione Potassium Self-Assembled Monolayer

Protection of self-assembled monolayers formed from triethyl phosphate and mixed self-assembled monolayers from triethyl phosphate and cetyltrimethyl ammonium bromide for copper against corrosion

Inhibition of Copper Corrosion by the Formation of Schiff Base Self-Assembled Monolayers

Preparation of Triazole Compounds Via Click Chemistry Reaction and Formation of the Protective Self-Assembled Membrane Against Copper Corrosion

Inhibition Action of the Self-Assembled Monolayers of P-hydroxybenzoic Acid on Copper

In Situ Click-Assembling Monolayers on Copper Surface with Enhanced Corrosion Resistance

Self-assembled monolayer of ammonium pyrrolidine dithiocarbamate on copper detected using electrochemical methods, surface enhanced Raman scattering and quantum chemistry calculations

Copper Corrosion Inhibition and Adsorption Behavior of 3-Amino-1,2,4-triazole

Corrosion Inhibition of Copper by 2,5-Dimercapto-1,3,4-thiadiazole Monolayer in Acidic Solution

INHIBITION OF COPPER CORROSION IN DEIONIZED WATER BY 3-AMINO-5-MERCAPTO-1,2,4-TRIAZOLE

Synthesis and Surface Characterization of Self-Assembled Monolayers of Thiazoles Incorporating Hydrocarbon and Fluorocarbon Chains on Copper Substrates

Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution

Arginine self-assembled monolayers against copper corrosion and synergistic effect of iodide ion