A SELF-LIMITED LARGE-DISPLACEMENT-RATIO MICROMECHANICAL AMPLIFIER

J. Li,Z. S. Liu,C. Lu,Q. X. Zhang,A. Q. Liu
DOI: https://doi.org/10.1109/SENSOR.2005.1496519
2005-01-01
Abstract:A micromechanical amplifier with large-displacement-ratio and self-limited output as a result of bifurcation effect is reported in this paper. The large output displacement is achieved by amplifying a small input motion through the elastic deformation of the compliant configuration, which realizes the self-limited output by bifurcation effect. The configuration of the compliant microstructures is analyzed with the results of as high as 100 times displacement magnification and self-limitation by bifurcation effect. Such kind of amplifier is fabricated by employing deep reactive ion etching (DRIE) process demonstrating the 52.0-mu m-output displacement when the input displacement is only 0.96 mu m with the displacement ratio of 54.2. Thereafter, the output displacement maintains stable due to the bifurcation effect.
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