Effect of Argon Ion Irradiation on Grain Orientation in Platinum Thin Films

BJ Jiang,J Jiang,CX Ren,XH Liu,X Wang,T Feng,ZX Zhang,ZT Song,LP Zheng

DOI: https://doi.org/10.1016/j.tsf.2005.01.009

IF: 2.1

2005-01-01

Thin Solid Films

Abstract:Platinum thin films were prepared on Mo/Si(100) substrate by Argon ion beam assisted deposition. X-ray diffraction analysis showed that the crystal orientation in Pt film was influenced by the incidence angle of the Ar+ beam. The films exhibited preferred (111) orientation without concurrent ion beam bombardment. The films, which were deposited with simultaneous bombardment by a 500 eV Ar+ beam along normal direction, showed mixed (111) and (200) orientation. Tilting the Ar+ beam off the normal direction of the film surface, the film exhibited highly preferred (111) orientation, even at the tilting angle of 45°. The results suggested that the surface free energy of (111) plane is much lower than that of other lattice planes and dominates during the film growing.