Effect of Al content on properties of Ti1-xAlxN hard film prepared by unbalanced magnetron sputtering

Yi-chen ZHANG,Da-Yang YU,Sheng-ge MA,Yan-wen LIU,De-chun BA
DOI: https://doi.org/10.3969/j.issn.1002-0322.2007.03.001
IF: 4
2007-01-01
Vacuum
Abstract:The unbalanced magnetron sputtering process was combined with cathode arc to prepare Ti1-xAlxN films.The mechanical properties of the films with different Al contents were characterized by SEM,XRD,microhardness tester,scratch and pin-on-disc wear testers.The results showed that the deposition rate increases with the increasing Al content.The film shows a maxinum micro-hardness value up to 2741.8HV and minimum friction coefficient down to 0.14 when x is 51at.%.All the films have TiAlN phase.The film surface becames more rough with increasing Al content.The bonding strengths between verious films with different Al content and substrates are almost the same,to which the critical load is about 16~20N.
What problem does this paper attempt to address?