Parallel Nanostructuring of Gesbte Film with Particle Mask

Z.B. Wang,M.H. Hong,B.S. Luk‘yanchuk,S.M. Huang,Q.F. Wang,L.P. Shi,T.C. Chong
DOI: https://doi.org/10.1007/s00339-004-2860-2
2004-01-01
Applied Physics A
Abstract:Parallel nanostructuring of a GeSbTe film may significantly improve the recording performance in data storage. In this paper, a method that permits direct and massively parallel nanopatterning of the substrate surface by laser irradiation is investigated. Polystyrene spherical particles were deposited on the surface in a monolayer array by self-assembly. The array was then irradiated with a 248-nm KrF laser. A sub-micron nanodent array can be obtained after single-pulse irradiation. These nanodents change their shapes at different laser energies. The optical near-field distribution around the particles was calculated according to the exact solution of the light-scattering problem. The influence of the presence of the substrate on the optical near field was also studied. The mechanisms for the generation of the nanodent structures are discussed.
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