Hydrogen Absorption Kinetics of Mg Thin Films under Mild Conditions

Jianglan Qu,Bo Sun,Rong Yang,Wei Zhao,Yuntao Wang,Xingguo Li
DOI: https://doi.org/10.1016/j.scriptamat.2009.11.033
IF: 6.302
2010-01-01
Scripta Materialia
Abstract:A series of Pd-Mg thin films with various thicknesses of Mg were prepared by magnetron sputtering. Their thickness-dependent hydrogen absorption kinetics in the temperature range 298-338 K was investigated by modeling the resistance. The hydrogen diffusion in MgH2 films was investigated by electrochemical measurements. We discuss the dominating factor of the absorption kinetics and the critical thickness of the passivating MgH2 layer, as well as the requirements for the advanced hydrogen storage materials under mild conditions. (C) 2009 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
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