Mgni/Pd Multilayer Hydrogen Storage Thin Films Prepared by Dc Magnetron Sputtering

H Wang,LZ Ouyang,CH Peng,MQ Zeng,CY Chung,M Zhu
DOI: https://doi.org/10.1016/j.jallcom.2005.03.127
IF: 6.2
2006-01-01
Journal of Alloys and Compounds
Abstract:MgNi/Pd multilayer thin films were deposited on Ni substrate by direct current (dc) magnetron sputtering using a dual-target, each MgNi layer being 40nm and each Pd layer being 16nm in thickness. The total thickness of the MgNi/Pd multilayer thin film is about 1.7μm. X-ray diffraction and scanning electron microscopy analysis revealed that the microstructure of the MgNi layer is amorphous and/or nanocrystalline and that the microstructure of the Pd layer is fine grained crystalline with no preferential orientation. A pressure–composition–isotherm (PCI) measurement of films proved that the hydrogen absorption content reached to 4.6mass% at room temperature and hydrogen desorption reached 3.4mass% hydrogen. The deposited MgNi/Pd multilayer thin films show an interesting behavior of discharge capacity with a maximal value of 505mAh/g.
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