Photosensitive Resin in Stereolithography Process

WANG Yong-zhen,WANG Ai-ling,XU Bing-she
DOI: https://doi.org/10.3321/j.issn:0529-6579.2007.z1.029
2007-01-01
Abstract:Stereolithgraphy nowadays is one of the most common rapid prototyping techniques. Photosensitive resins are main materials in the stereolithography process to obtain parts with specific shapes and applications. In this paper, the optimization of synthesis conditions for photosensitive resins had been studied. Photosensitive resins were characterized by the DSC, TGA, and FTIR. The results show that the sample had higher thermal stability properties, with the most pronounced improvements obtained for the reinforced epoxy acrylate specimens. The relation between post-cure shrinkage and the various process parameters used in the SL also have been investigated.
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