Development of a Hybrid Photopolymer for Stereolithography

Gan Zhiwei,Mo Jianhua,Huang Shuhuai,Xie Hongquan
DOI: https://doi.org/10.1007/bf02861482
2006-01-01
Journal of Wuhan University of Technology-Mater Sci Ed
Abstract:New liquid free radical-cationic hybrid photopolymer, consisting of acrylate-based photocurable resin and epoxy-based photosensitive resin for stereolithography by UV laser was developed. The experiment results indicated that the hybrid photopolymer exhibits advantages of both the acrylate-based photosensitive resin and the epoxy-based photosensitive polymer contained in the hybrid system with relatively high photospeed and low linear shrinkage. Stereolithography parts without obvious distortion were built on the stereolithography apparatus HRPLA-I from this hybrid resin successfully and efficiently.
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