Temperature dependence of the dielectric properties of mesoporous silica films prepared by a sol–gel route in the presence of polyether modified polydimethylsiloxane

Dong Dong,Ni Wang,Xiaobo Liu,Weidong Xue,Wencheng Hu
DOI: https://doi.org/10.1007/s10854-011-0343-8
2011-01-01
Abstract:Mesoporous silica films were prepared from tetraethylorthosilicate by an acid-catalyzed sol–gel process in the presence of side-chain polyether modified polydimethylsiloxane. The samples were characterized using Fourier transform infrared spectroscopy, differential thermal analysis and thermogravimetric analysis, field emission scanning electron microscopy, and atomic force microscopy. Furthermore, the dielectric properties of the silica films annealed at different temperatures were investigated at frequencies ranging from 1 to 200 kHz. In addition, the temperature dependence of the dielectric properties of as-prepared porous silica films is discussed in detail.
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