Fabrication and characteration of nanoporous silica film

Mingzhi Yin,Liangying Zhang,Xi Yao,殷明志,张良莹,姚熹
DOI: https://doi.org/10.3969/j.issn.1671-8267.2003.02.010
2003-01-01
Abstract:Colloidal silica sol is formed by a novel hydrolyzing procedure of tetraethyl-orthosilicate(TEOS) catalyzing with NH3 · H 2O in aqueous mediums. Glycerol, combining with the hydrolyzed intermediates of TEOS, controls growing of the silica particles; poly(vinyl-vinyl alcohol makes the colloidal silica sol with polymeric structure and spinning, thermal strain makes the gel silica film changed into a nanoporous structure with diameter ranging 50 - 150 nm. Morphologies of the nanoporous silica film Him have been characterized; the porosities (%) is 32-64; the average dielectric constant at 1MHz region is 2.0 and 2.1; the thermal conductivity is less than 0.8. Chemical mechanism of the sol-gel process is discussed.
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