Abstract:The wide-angle lens is widely used with the advantage of a large field of view, but it is difficult to solve the problem of large distortion. Therefore, the research on how to design a wide-angle low-distortion lens with excellent imaging quality is very meaningful. In this paper, we propose a high-performance wide-angle small distortion optical system, which has a horizontal field angle of 110 degrees and a vertical field angle of 77 degrees, focal length of 2.03mm, f number of 1.65, and a total length of 16.5mm. By introducing a non-rotational symmetric freeform surface into the last side of the wide-angle optical system and combining with several even aspheric surfaces, the f-tan(theta) distortion in the X direction is controlled to -6%similar to+1%, and the f-tan(theta) distortion in the Y direction is controlled to less than 1%. At the same time, the MTF of the system is greater than 0.35 at 125lp/mm, so that the circular image plane can better adapt to the rectangular sensor. In addition, due to the introduction of the freeform surface in the system, the change of system structure with temperature becomes more complex. We carry out thermal analysis for this surface and calculate the change of structure with temperature. Finally, we completed the athermalized design of the lens, so that the wide-angle lens can work in the range of -40 degrees C similar to+80 degrees C. This optical system has great development potential in security monitoring, UAV detection and other fields that may encounter extreme environments.

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Design of reflective projection lens with Zernike polynomials surfaces

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Freeform Surface Lens for LED Uniform Illumination.

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Design of Athermalized Wide-Angle Low-Distortion Lens Using Freeform Surface

Freeform Surface Lens Design for Uniform Illumination

Design of a Panoramic Annular Lens with a Horizontal Symmetric FOV

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Method to design two aspheric surfaces for imaging system

Design method of freeform off-axis three-mirror reflective imaging systems

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Freeform lens for off-axis illumination in optical lithography system