An Improved On-Wafer Measurement Method for PHEMT Modeling for Millimeter Wave Application

Xiuping Li,Jianjun Gao,Choi Look Law,Sheel Aditya,Georg Boeck
DOI: https://doi.org/10.1023/A:1026003921968
2003-01-01
International Journal of Infrared and Millimeter Waves
Abstract:An improved on-wafer measurement method by using coaxial calibration instead of on-wafer calibration for PHEMT modeling is proposed in this paper. The advantage is that S-parameters of PHEMT device can be measured on wafer without impedance standard substrate (ISS) after the S-parameters of the microprobes have been determined. Excellent agreement is obtained between on-wafer calibration measurement and coaxial calibration measurements, respectively.
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