Preparation and Characterization of SiO<inf>2</inf> Nano-Rods by CVD Method
Guang Zhu,Xiaoping Zou,Jin Cheng,Hongdan Zhang,Fei Li,Pengfei Ren,Maofa Wang,Yi Su
DOI: https://doi.org/10.1109/inec.2008.4585510
2008-01-01
Abstract:A simple method is presented for the preparation of silica nano-rods. The silica nano-rods with a diameter of about 200 nm with smooth surface were synthesized by chemical vapor deposition method at 1300square. The as-synthesized samples were characterized by means of scanning electron microscopy, energy dispersive x-ray, and transmission electron microscopy. The results show that synthesized silica nano-rods have a uniform size, well-defined shape, and smooth surface. However, the morphologies and microstructures of silica nano-rods are affected by synthesis conditions, such as the synthesis temperature and the vapor concentration of the SiO x . On the basis of these experimental results, a possible growth mechanism of silica nano-rods in this process is proposed.