Strain in GaAsSb quantum well studied by X-ray diffraction and Rutherford backscattering/channeling

Shengqiang Zhou,Shude Yao,Mingfang Wu
DOI: https://doi.org/10.1016/j.spmi.2011.02.004
IF: 3.22
2011-01-01
Superlattices and Microstructures
Abstract:The strain state of a GaAs1−xSbx/GaAs single quantum well (SQW) was studied using high resolution X-ray diffraction (HR-XRD) and Rutherford backscattering/channeling (RBS/C). The results reveal that the GaAsSb quantum well has good crystalline quality and the Sb content x of the GaAsSb layer is 0.36. The 7.3nm GaAs0.64Sb0.36 layer is highly strained with a perpendicular elastic strain of 2.0% and a degree of relaxation of 0.23. Photoluminescence (PL) measurement at room temperature presents a peak at 0.995eV (1.224μm) with a linewidth of 67meV, revealing the optical properties of the GaAsSb SQW.
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