Structure and Properties of Mg-Cu-Y Amorphous Film Deposited on AZ31 Alloy

GUO Guang-wei,WANG Hai-yan,TANG Guang-ze,MA Xin-xin
2009-01-01
Abstract:Mg-Cu-Y films were deposited on AZ31 alloy by unbalanced magnetron sputtering.The targets made of pure copper and Mg_65Cu_25Y_10 alloy were adopted.The depositions were carried out by two different modes,that is,deposition by using Mg_65Cu_25Y_10 alloy target alone and co-deposition with Mg_65Cu_25Y_10 alloy target and copper target.The phases of the deposited films were analyzed by glancing incidence X-Ray diffraction(GXRD).The morphology of the films and the wear traces were observed by atom force microscope(AFM) and scanning electronic microscopy(SEM),respectively.The hardness of the films was measured by nano-indentation tests.The friction tests were conducted on a ball-disk friction tester.The results show that the structure of the film deposited by Mg_65Cu_25Y_10 is amorphous and no crystalline phase is found.For the films deposited by co-depositition,crystalline copper is detected.The film deposited by Mg_65Cu_25Y_10 exhibits the maximum hardness of 12GPa.The film containing crystalline copper phase deposited by co-depositition shows the better wear resistance.
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