Zr55Al10Ni5Cu30 amorphous alloy film prepared by magnetron sputtering method

Dong-Mei Mi,Sheng-Li Zhu,Yan-Qin Liang,Zhao-Yang Li,Zhen-Duo Cui,Xian-Jin Yang,Akihisa Inoue
DOI: https://doi.org/10.1007/s12598-020-01459-5
IF: 6.318
2020-07-16
Rare Metals
Abstract:<span class="a-plus-plus abstract-section id-a-sec1"><p class="a-plus-plus">In this work, amorphous Zr<sub class="a-plus-plus">55</sub>Al<sub class="a-plus-plus">10</sub>Ni<sub class="a-plus-plus">5</sub>Cu<sub class="a-plus-plus">30</sub> alloy thin film was prepared on D36 steel substrate by magnetron sputtering method. The film was characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), atomic force microscopy (AFM), hardness tester and nano indentation. Corrosion behavior of the film was investigated in 3.5% NaCl aqueous solutions by an electrochemical method. At room temperature, the amorphous alloy film was formed completely after sputtering for 5 h. The surface morphology of the amorphous alloy film was uniform and smooth. Formation of the amorphous alloy film improved the microhardness and corrosion resistance of the D36 substrate. The amorphous alloy film (prepared at room temperature for 5 h) exhibited good adhesion strength with the substrate. The as-sputtered sample exhibited a crevice corrosion trend when the sputtering time was too short (1 h) or too long (10 h).</p></span><span class="a-plus-plus abstract-section id-a-sec2 outputmedium-online"><h3 class="a-plus-plus">Graphic abstract</h3></span>
materials science, multidisciplinary,metallurgy & metallurgical engineering
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