Influence of Crystal Orientation on Copper Oxidation Failure

Jie Gao,Anmin Hu,Ming Li,Dali Mao
DOI: https://doi.org/10.1016/j.apsusc.2009.01.040
IF: 6.7
2009-01-01
Applied Surface Science
Abstract:The influences of crystal orientation on copper oxidation were investigated. The results indicated that crystal orientation of copper substrate has a great effect on the growth rate, the morphology of oxide film and the extent of oxidation failure. Shear test showed the adhesion strength between Cu(110) and its oxide film was the highest, whereas, the adhesion strength between Cu(311) and its oxide film was the lowest. SEM observations revealed that the oxide film grown on Cu(311) delaminated from substrate seriously, while the oxide film grown on Cu(100) and Cu(110) did not reveal such a phenomenon. Cu(100) and Cu(110) exhibited thinner oxide thickness compared to those on Cu(311) and Cu(111). The activation energy for oxide growth on Cu(100) and Cu(110) was calculated to be the highest while that on Cu(311) was the lowest.
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