STUDY OF ANALYSIS OF NANO FILM ON METAL SURFACE BY GLOW DISCHARGE EMISSION SPECTROMETRY

HE Xiao-lei,ZHANG Yi,LAN Min-bo,CHEN Ying-ying,WU Jun-fei,WANG Yan-ping
DOI: https://doi.org/10.3321/j.issn:1001-4020.2006.09.001
2006-01-01
Abstract:A method of glow discharge(GD) emission spectrometry for the analysis of nano film on metal surface was discribed in this paper.Analytical parameters of the GD source were optimized.The sputtering yield was experimentally determined for establishing corrected calibration curves.It was experimentally verified that the proposed method has good accuracy and precision in film thickness determination.The method has been applied to the analysis of nano film on the surface of several metal meterials.
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