Suppression of Hot-Electron-Induced Interface Degradation in Metal-Oxide-Semiconductor Devices by Backsurface Argon Bombardment

MQ Huang,PT Lai,JP Xu,SH Zeng,GQ Li,YC Cheng
DOI: https://doi.org/10.1016/s0026-2714(98)00043-2
IF: 1.6
1998-01-01
Microelectronics Reliability
Abstract:Low-energy (550 eV) argon-ion beam was used to bombard directly the backsurface of polysilicon-gate metal-oxide-semiconductor (MOS) capacitors after the completion of all conventional processing steps. The effects of this extra step on the interface characteristics of the MOS capacitors before and after hot-electron injection were investigated. After the backsurface argon-ion bombardment, the MOS capacitors showed improved interface hardness against hot-electron-induced degradation. A turn-around behavior was observed, indicating that an optimal bombardment time should be used. The physical mechanism involved could possibly be stress compensation at the Si/SiO2 interface, induced by the backsurface bombardment.
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