Conformal Dielectric Overlayers for Engineering Dispersion and Effective Nonlinearity of Silicon Nanophotonic Wires.

Xiaoping Liu,William M. J. Green,Xiaogang Chen,I-Wei Hsieh,Jerry I. Dadap,Yurii A. Vlasov,Richard M. Osgood
DOI: https://doi.org/10.1364/ol.33.002889
2008-01-01
Abstract:We introduce and study numerically a method for dispersion engineering of Si nanophotonic wires using a thin conformal silicon nitride film deposited around the Si core. Simulations show that this approach may be used to achieve the dispersion characteristics required for broadband, phase-matched, four-wave mixing processes, while simultaneously maintaining strong modal confinement within the Si core for high effective nonlinearity.
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