Hot-Electron Energy Relaxation Time in Alinn/Aln/Gan 2deg Channels

A. Matulionis,J. Liberis,E. Sermuksnis,J. Xie,J. H. Leach,M. Wu,H. Morkoc
DOI: https://doi.org/10.1088/0268-1242/23/7/075048
IF: 2.048
2008-01-01
Semiconductor Science and Technology
Abstract:A microwave noise technique has been used for experimental investigation, at room temperature, of power dissipation in the voltage-biased two-dimensional electron gas channel located in the GaN layer of a lattice-matched Al(0.82)In(0.18)N/AlN/GaN heterostructure. No saturation of the relaxation time is found in the investigated electron temperature range up to similar to 2800 K: the hot-electron energy relaxation time decreases from similar to 6 ps at near equilibrium to 75 +/- 20 fs at similar to 200 nW/electron. The electron drift velocity reaches similar to 1.8 x 10(7) cm s(-1) at 65 kV cm(-1) electric field. The hot-phonon effect on power dissipation is discussed.
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