Abstract:Understanding the properties that determine the distribution and behavior of trace impurities in Si wafers is critical to defining and controlling the performance, reliability, and yields of integrated microelectronic devices. It remains, however, an intrinsically difficult task to determine trace impurities in Si because of the minute concentrations and extremely high levels of matrix involved. In this study, we used an electrodialyzer for the simultaneous on-line removal of the silicate and acid matrices through the neutralization of the excessive hydrogen ion and selectively separation of acid and silicate ions by the combination of electrode reaction as a source of hydroxide ions with the anion exchange membrane separation. To retain the analyte ions in the sample stream, we found that the presence of moderate amounts of nitric acid and hydrazine were necessary to improve the retention efficiency, not only for Zn(2+), Ni(2+), Cu(2+), and Co(2+) ions but also for CrO(4)(2-) ion. Under the optimized conditions, the interference that resulted from the sample matrix was suppressed significantly to provide satisfactory analytical signals. The precision of this method was ca. 5% when we used an electrodialyzer equipped with an anion exchange membrane to remove the sample matrix prior to performing inductively coupled plasma mass spectrometry (ICP-MS); the good agreement between the data obtained using our proposed method and those obtained using a batchwise wet chemical technique confirmed its accuracy. Our method permits the determination of Zn, Ni, Cu, Co, and Cr in Si wafers at detection limits within the range from 2.2 x 10(15) to 9.0 x 10(15) atoms cm(-3).

Determination of Trace Metal Impurities in Solar Grade Polysilicon by ICP-MS

Coupling of an electrodialyzer with inductively coupled plasma mass spectrometry for the on-line determination of trace impurities in silicon wafers after surface metal extraction

Determination of Impurity Elements in MnZn Ferrites by Inductively Coupled Plasma Mass Spectrometry

Trace Amounts of Impurities in Electrolytic Manganese Metal by Sector Field Inductively Coupled Plasma Mass Spectrometry

Mass Spectrometric Methods of Impurity Analysis in Solar-Grade Crystalline Silicon

Determination of Trace Aluminum in High-purity Silicon with Chrome Azurol S Spectrophotometry by Nonlinear Fitting

Quantitative Determination of Trace Metals in High-Purity Silicon Carbide Powder by Laser Ablation Inductively Coupled Plasma Mass Spectrometry Without Binders

Determination of Iron and Aluminum in Polycrystalline Silicon by Spectrophotometry

Determination of Major and Trace Elements in Zirconium Alloys by ICP-AES

Study on determination of impurities in tungsten concentrates with ICP-MS

Determination of 15 Impurity Elements in Quartz Sand by Inductively Coupled Plasma-Atomic Emission Spectrometry

Determination of Metal Impurity Elements in Lithium Hexafluorophosphate Using Inductively Coupled Plasma Tandem Mass Spectrometry Based on Reaction Gas Mixtures

Determination of impurity elements in tungsten concentrates by ICP-MS

Accurate Determination of Non-Metallic Impurities in High Purity Tetramethylammonium Hydroxide Using Inductively Coupled Plasma Tandem Mass Spectrometry

Determination Of Trace Elemental Inpurities In High Purity Trimethylgallium By Inductively Coupled Plasma-Atomic Emission Spectrometry

Determination of trace elements in high purity nickel by high resolution inductively coupled plasma mass spectrometry

Determination of seventeen impurity elements in high purity selenium by inductively coupled plasma mass spectrometry after extraction separation with 4-methyl-2-ketone

Direct Determination of Impurities in High Purity Silicon Carbide by Inductively Coupled Plasma Optical Emission Spectrometry Using Slurry Nebulization Technique

Determination Of Dissolved Silicon In Natural Water By Inductively Coulpled Plasma-Mass Spectrometry After Off-Line Preconcentration

Quantification of Trace Amounts of Impurities in High Purity Cobalt by High Resolution Inductively Coupled Plasma Mass Spectrometry

Analysis of Ultra-Trace Impurities in High Purity Molybdenum Powder through Inductively Coupled Plasma Tandem Mass Spectrometry