Effects of sputtering conditions on the anisotropic magnetoresistance of Ni80Fe20 thin films

He-ying WANG,Wen-bo SUN,Wei-hong MAO
DOI: https://doi.org/10.3969/j.issn.1005-4642.2007.08.001
2007-01-01
Abstract:Effects of sputtering conditions,such as substrate temperature and sputtering pressure,on the AMR of Ni80Fe20 thin films prepared by magnetron sputtering have been investigated.It is found that the substrate temperature is the most important factor to influence AMR values of Ni80Fe20 thin films.At a higher substrate temperature,sputtering pressure has an obvious influence on AMR values of Ni80Fe20 thin films,too.The Ni80Fe20 films prepared at substrate temperatures of 150 ~ 180 °C and sputtering pressures of 0.3 ~ 0.5 Pa show higher AMR values of about 3.7% ~ 4.3 %.
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