Characteristics of a large-scale ion beam etcher based on radio frequency linear source

Xiao-hao DONG,Ying LIU,Fei-yun ZHAO,De-quan XU,Xiang-dong XU,Yin-gui ZHOU,Xiao WANG,Chuan-rong YAO,Yi-lin HONG,Shao-jun FU,Chao-yin XU

DOI: https://doi.org/10.3969/j.issn.0253-2778.2007.04.034

2007-01-01

Journal of University of Science and Technology of China

Abstract:The characteristics of a large scale ion beam etcher with a radio frequency linear source were described. With a 6 cm × 66 cm rectangular beam which the substrate carriage traverses back and forth, an area as large as 40 cm×40 cm can be covered. According to the illustration of the operating principle, construction features of the etcher, commissioning results and technical performance were presented. Measurements with a scanning Faraday-cup based on current probe were used to optimize the ion beam spatial uniformity. A ±5.3% uniformity of current density along the major axis of the ion source was achieved. Etching experiments show a good uniformity of ±5.4% of etching depth over the 40 cm. The uniformity can be improved combined with beam revising by beam diaphragm and correction mask. Through the measurement of beam current stability, performance of the system was also taken into account.