The Behavior of Dopant Incorporation and Internal Strain in AlxGa1−xAs0.03Sb0.97 Grown by Molecular Beam Epitaxy

AZ LI,JX WANG,YL ZHENG,GP RU,WG BI,ZX CHEN,NC ZHU
DOI: https://doi.org/10.1016/0022-0248(93)90684-o
IF: 1.8
1993-01-01
Journal of Crystal Growth
Abstract:Electrical properties and donor ionization energy level E(D) in Te-doped n-AlxGa1-xAs0.003Sb0.97 (0 < x < 0.8) grown by MBE have been investigated. The electron concentration of Te-doped AlGaAsSb was found to be strongly affected by the Al composition and by the donor energy level E(D) for Te. E(D) takes the form of an inverted ''W'' with a maximum at the GAMMA-L direct-indirect band crossover and L-X crossover. The structural characteristics of the AlGaAsSb/GaAs have been studied by double-crystal X-ray diffraction. Results show that the lattice misfit strain was not fully relaxed by the generation of mismatch dislocations.
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