Influence of O_2/Ar Flow Ratio on Microstructures and Photoluminescence of ZnO Films
Wang Xiaoxiao,Xia Qiping,Lü Jianguo,Song Xueping,Sun Zhaoqi
DOI: https://doi.org/10.3969/j.issn.1672-7126.2011.04.03
2011-01-01
Abstract:The ZnO films were deposited by reactive RF magnetron sputtering on Si and quartz substrates.The impacts of growth conditions,including the flow ratio of oxygen and argon,pressure,substrate temperature,and sputtering power,on ZnO film's quality were studied.Its microstructures and optical properties were characterized with X-ray diffraction,atomic force microscopy,and fluorescence spectroscopy.The results show that the ratio of oxygen and argon flow rate strongly affects the microstructures of the ZnO films.For example,at a ratio of 3∶4,the film is found to be highly crystalline with the lowest surface roughness of 0.725 nm.The strong violet emission,peaking at 407 nm,was observed,possibly because of the electron transition between the shallow oxygen donor levels to the top valence band of ZnO.As the ratio increased,the violet emission peak first rapidly moves up,then,slowly decreases.