Design Rule and Orientation Layout for MEMS Curved Beams on Silicon

Tzung-Ming Chen,Zhenyu Liu,Jan G. Korvink,Ulrike Wallrabe
DOI: https://doi.org/10.1109/jmems.2010.2048416
IF: 2.829
2010-01-01
Journal of Microelectromechanical Systems
Abstract:An analysis method used to choose a suitable structural orientation layout for a microcompliant mechanism, which includes multi-curved-beams, is introduced, particularly, for fabricating microelectromechanical-systems (MEMS) thin-curved-beam microstructures on (100) and (111) single-crystal silicon (SCS) wafers. The achievement of a large deflection of a fabricated SCS device verifies the usability of this design rule. The orientation layouts of the device for a large deflection are restricted to a specific region. Based on the analysis method, it is better to follow a 21 degrees safe region between the < 100 > and < 110 > orientations in order to decrease the possibility of crystal slip failure. Using this design consideration, one can design more robust MEMS compliant mechanisms from SCS, exploiting its ideal elasticity.
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