Plasma Oxidation for Achieving Supported TiO2photocatalysts Derived from Adsorbed TiCl4using Dielectric Barrier Discharge

Xiu-Ling Zhang,Long-Hui Nie,Yong Xu,Chuan Shi,Xue-Feng Yang,Ai-Min Zhu
DOI: https://doi.org/10.1088/0022-3727/40/6/024
2007-01-01
Journal of Physics D Applied Physics
Abstract:At atmospheric pressure and room temperature, dielectric barrier discharge induced plasma oxidation for achieving supported TiO2 photocatalysts derived from TiCl4 adsorbed onto gamma-Al2O3 pellets was studied. The supported TiO2/gamma-Al(2)O(3)photocatalysts prepared by a cyclic 'adsorption-discharge' approach, without requirement of heat treatment, exhibit high activity in the photocatalytic degradation reaction of formaldehyde. The mass spectra and optical emission spectra during O-2/Ar discharge for oxidizing the adsorbed-state TiCl4 were measured. The mechanism for the TiO2 formation from adsorbed-state TiCl4 by plasma oxidation was discussed.
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