Laser-induced Damage Resistance of Thin-Film Polarizers Prepared by Ion-Assisted Deposition.

PF GU,JF TANG
DOI: https://doi.org/10.1364/ol.19.000081
1994-01-01
Abstract:An investigation of the effects of ion-assisted deposition on the laser-induced damage threshold of thin-film polarizers has been carried out. It shows that the laser-induced damage threshold of polarizers with 50-100-eV oxygen-ion bombardment during deposition is improved considerably.
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