Ballistic Transport in Planar 2-D ZnXN2 (X = Si, Ge) Transistors With Ultrahigh On-State Current
Jialin Yang,Chuyao Chen,Xiang Chen,Zhenhua Wu,Siyu Yang,Hao Shi,Nan Jiang,Shengli Zhang,Haibo Zeng
DOI: https://doi.org/10.1109/ted.2024.3405402
IF: 3.1
2024-06-21
IEEE Transactions on Electron Devices
Abstract:As traditional field-effect transistors (FETs) based on silicon scaling to approach physical limits, it is of great importance to explore novel solutions to address this issue. Two-dimensional semiconductors are recognized as a promising prospect for future high-performance (HP) FETs. Given that 2-D ZnXN2 (X = Si, Ge) possesses environmental friendliness, high stability, graphene-like structure, and single-atomic-layer thickness, a comprehensive investigation on their electronic and transport properties is desirable. Two-dimensional ZnSiN2 and ZnGeN2 possess semiconducting bandgaps of 2.6 and 1.6 eV, respectively. In particular, the isotropic and sharp band edge dispersions induce light electron effective masses. Also, the high phonon-limited mobilities and mean free paths longer than channel length are obtained to ensure the ballistic transport operation. Notably, 2-D ZnSiN2 and ZnGeN2 FETs with 10-nm gate present the ultrahigh on-state current of 6730 and A/ m for HP applications. Moreover, ultrascaled 3–10-nm and 12-nm ZnXN2 FETs can fulfill the International Technology Roadmap for Semiconductors (ITRSs) and the International Roadmap for Devices and Systems (IRDS) 2028 demands for HP devices in terms of on-state current, delay time, and power-delay product (PDP). We believe that our findings will shed light on the applications of 2-D ZnXN2 in future HP nanoelectronics.
engineering, electrical & electronic,physics, applied