Optimization Design of Uncooled Amorphous Silicon Thin Film Transistor Infrared Detector

LIU Xing-ming,FANG Hua-jun,LIU Li-tian
2007-01-01
Abstract:The basic characteristics and parameters of uncooled amorphous silicon thin film transistor were introduced,and the influence of aspect ratio on performance was analyzed.According to the results,the performance can be improved by increasing the aspect ratio of the transistor.New type of thermal isolation material(Polyimide-PI) was presented to overcome the disadvantage of low yield of traditional microbridge thermal isolation structure.New uncooled infrared detector based on the thermal isolation material and amorphous transistor was fabricated to verify the thermal isolation capability of the material.
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