Abstract:Summary: The wavelength‐dependent vacuum ultraviolet (VUV) photolysis of several polymers, low density polyethylene (LDPE), biaxially oriented poly(propylene) (BOPP), atactic polystyrene (PS), and poly(methyl methacrylate) (PMMA), was studied by irradiation in vacuum with the well‐characterized emissions from four different resonant or excimer VUV sources. These lamps comprise radiofrequency (r.f.) discharges in different noble gases, such as krypton, xenon (at low pressures, producing near‐monochromatic resonant line radiations), xenon excimer (at “high” pressure), and a deuterium/argon mixture (producing a broad‐band emission). VUV‐induced mass loss (ablation or etching) was monitored in situ by quartz crystal microbalance measurements. Following irradiation, samples were analysed by ATR‐FTIR and XPS, to evaluate near‐surface structural changes (e.g., creation of unsaturation, cross‐linking) resulting from the VUV‐initiated bond scissions and radical‐creation reactions. PMMA was the most readily ablatable polymer, whereas the mass loss of BOPP was higher than that of LDPE, regardless of the irradiation wavelength, λ. All polymers were found to form double bonds, with the exception of PS, which is rather stable, probably due to energy dissipation by fluorescence. Formation of double bonds in a) vinyl‐, b) vinylidene‐, and c) vinylene‐like unsaturated groups, as a function of the radiation dose, D, for KrL (▪), XeL (▴), and D2Ar‐irradiated (•) PMMA. Formation of double bonds in a) vinyl‐, b) vinylidene‐, and c) vinylene‐like unsaturated groups, as a function of the radiation dose, D, for KrL (▪), XeL (▴), and D2Ar‐irradiated (•) PMMA.

Molecular Weight Effects on the 248-Nm Photoablation of Polystyrene Spun Films

Photoablation of polymers

Photoablative Etching of Polymers for Integrated Optoelectronic Devices

Effects of Molecular Weight, Solvent and Substrate on the Dewetting Morphology of Polystyrene Films

Effect of the Molecular Weight on Deformation States of the Polystyrene Film by AFM Single Scanning.

Photoablative Etching of Materials for Optoelectronic Integrated Devices

Effects of Molecular Weight on the Liquid-Liquid Transition in Polystyrene Melts Studied by Low-Frequency Anelastic Spectroscopy

Molecular Weight and Interfacial Effect on the Kinetic Stabilization of Ultrathin Polystyrene Films

Physical and chemical changes in polystyrene during electron irradiation using EELS in the TEM: contribution of the dielectric function

Effects of Molecular Weight on Liquid-Crystalline Behavior of a Mesogen-Jacketed Liquid Crystal Polymer Synthesized by Atom Transfer Radical Polymerization

Effect of Ablation Photon Energy on the Distribution of Molecular Species in Laser-Induced Plasma from Polymer in Air

Influence of molecular architecture on the dewetting of thin polystyrene films

Investigating the effect of gliding discharge plasma on polystyrene and Polyamide6 by positron annihilation lifetime spectroscopy

Effects of Copolymer Composition, Film Thickness, and Solvent Vapor Annealing Time on Dewetting of Ultrathin Block Copolymer Films.

Effect of electron irradiation on polypropylene and polystyrene foils studied by pattern recognition methods on electron spectroscopy data

X-ray photoelectron spectroscopy of KrF laser-irradiated polycarbonate films

EUV ablation of organic polymers at a high fluence

Laser Photoablation of Poly-Ethylcyanoacrylate and Spin-On-Glass Photoresists

Vacuum Ultraviolet Photolysis of Hydrocarbon Polymers

Analysis of the Dynamics of Laser Ablation of Polymers

Electrosprayed Chitosan Nanospheres-Based Films: Evaluating the Effect of Molecular Weight on Physicochemical Properties