Focused ion beam–based nanoimprint stamp for replicating micro/nanostructures under low temperature

Hongwen Sun,Liu Guogao,Shanming Lin,Jingquan Liu,Di Chen
DOI: https://doi.org/10.1117/1.3469818
2010-01-01
Abstract:Focused ion beam (FIB) was employed to fabricate nanoimprint lithography stamps. Complex micro/nanopatterns were fabricated in the stamp, including curved nanograting structures. These micro/ nanostructures were then replicated to SU-8 2000.1 resist, with an imprint temperature of 95 degrees C, which is lower than for conventional imprint polymers. Atomic force microscopy was used to characterize the surface profiles of stamp and replica's and the replication fidelity as well. The results show that nanoimprint with the FIB fabricated stamp can successfully replicate complex micro/nanostructures under low temperature in SU-8. (c) 2010 Society of Photo-Optical Instrumentation Engineers. [DOI: 10.1117/1.3469818]
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