The Structure and Optical Properties of SiC Film on Si (111) Substrate with a ZnO Buffer Layer by RF-magnetron Sputtering Technique

Z. D. Sha,X. M. Wu,L. J. Zhuge

DOI: https://doi.org/10.1016/j.physleta.2006.01.105

IF: 2.707

2006-01-01

Physics Letters A

Abstract:We have fabricated a multiply layer SiC/ZnO on Si substrates using the RF-magnetron sputtering technique with the targets of a single crystalline SiC and a polycrystalline ZnO. The as-deposited films were annealed in the temperature range of 600-1000 degrees C under nitrogen ambient. We have observed a strong ultraviolet (UV) emission (370 nrn) from the as-deposited SiC/ZnO film and an intense violet emission (412 nm) from the film annealed at high temperature (1000 degrees C) under nitrogen ambient. The SiC film quality and the PL intensities are considered to be strongly dependent on the crystalline quality of the ZnO buffer layer. With the increase of the annealing temperature, the crystalline quality of the ZnO buffer layer is improved, resulting in the improvement of the SiC film quality and the increase of the PL intensities. The thin films have been characterized by X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR) and scanning electron microscopy (SEM) to provide the evidences of photoluminescence (PL). We suggest that the UV emission could be attributed to the nanocrystal silicon particles, that the 395 nm band is related to ZnO buffer layer and has a great relation to the crystalline quality of the ZnO film, and that the violet emission is associated with the emission luminescence from 6H-SiC, which bears on the SiC film quality. The obtained results are expected to have important applications in modem optoelectronic devices. (c) 2006 Elsevier B.V. All rights reserved.