The influence of an AlN seeding layer on nucleation of self-assembled GaN nanowires on silicon substrates
Yaozheng Wu,Bin Liu,Zhenhua Li,Tao Tao,Zili Xie,Ke Wang,Xiangqian Xiu,Dunjun Chen,Hai Lu,Rong Zhang,Youdou Zheng
DOI: https://doi.org/10.1088/1361-6528/ab4a4b
IF: 3.5
2019-10-28
Nanotechnology
Abstract:Gallium nitride (GaN) based nanowires (NWs) have attracted much attentions for the fabrication of novel nanostructure devices. In this paper, the influences of AlN seeding layer on the nucleation of self-assembled GaN NWs grown by plasma-assisted molecular beam epitaxy (PA-MBE) on Si (111) substrates have been investigated. Not only the formation of two-dimensional (2D) compact GaN layer at the bottom of the NWs is suppressed, but also high density of vertically aligned well-separated GaN NWs originate from GaN island are obtained successfully after introducing annealing and nitridation processes. Combined with scanning electronic microscope (SEM) and transmission electron microscopy (TEM) measurements, the NWs show a high crystalline wurtzite structure with nearly free of dislocations or stacking faults and the NW diameter remains constant over almost the entire length. Due to the certain temperature-dependent diffusion length of Ga adatoms during nucleation process, the formation of well-separated nanowires relies on the distribution and the morphology of the underlying AlN seeding layer. Moreover, the SixNy layer served as mask to relieve the coalescence processes of these nucleation sites. The developed growth processes and the obtained results can provide a viable path to facilitate the MBE-growth techniques on fabricating Ⅲ-nitride NW-based materials and relative devices on Si substrates.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology