Fabrication of needle-shaped GaN nanowires by ammoniating Ga2O3 films on MgO layers deposited on Si (111) substrates

Yujie Ai,Chengshan Xue,Chuanwei Sun,Lili Sun,Huizhao Zhuang,Fuxue Wang,Zhaozhu Yang,Lixia Qin
DOI: https://doi.org/10.1016/j.matlet.2007.01.027
IF: 3
2007-01-01
Materials Letters
Abstract:Needle-shaped GaN nanowires have been synthesized on Si (111) substrate through ammoniating Ga2O3/MgO films under flowing ammonia atmosphere at the temperature of 950 °C. The as-synthesized GaN nanowires were characterized by X-ray diffraction (XRD), Fourier transformed infrared (FTIR) spectroscopy, scanning electron microscope (SEM) and high-resolution transmission electron microscopy (HRTEM). The results demonstrate that these nanowires are hexagonal GaN and possess a smooth surface with an average diameter about 200 nm and a length ranging from 5 μm to 15 μm. In addition, the diameters of these nanowires diminish gradually. The growth mechanism of crystalline GaN nanowires is discussed briefly.
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