Application of Ω Scan and Φ Scan in the Characterization of the Structure of Thin Films

QIN Dongyang,LU Yafeng,ZHANG Kong,LIU Qian,ZHOU Lian
2011-01-01
Abstract:X-ray diffraction which is considered as an nondestructive examination technique has been widely used in the characterization of the structure of thin films.Based on the Bragg equation,ω scan and φ scan are applicable for analyzing the fiber texture and in-plane texture of the thin films.Diffraction geometry,principle as well as the experimental setup in the four-circle diffractometer were underlined.The widespread application of both methods in metal thin films,oxide thin films and semiconductor films shows the advantage of the ω scan and φ scan in the film structure analysis.
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