Analysis the Influence of Annealing on the Resistance of NiCr Thin Film

谢生,侯玉文,陈朝,毛陆虹,陈松岩
2009-01-01
Abstract:Ni80Cr20 thin films with different thickness were prepared on Si substrate by magnetron supttering method,and the film resistances were fabricated by lift-off technique.The experimental results showed that the as-deposited grains were small,and therefore the resistance was large.When the annealing temperature exceeded 350 ℃,the small grains merged into a large one,the intercrystalline area decreased,and the resistance decreased drastically.The grain size tended to saturation when the annealing was carried out at 450 ℃ for 5 min,and the influence of annealing time on the resistance can be neglected.
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