Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Nanosphere monolayer-templated, ion-assisted nanofeature etching in dielectric materials: a numerical simulation of nanoscale ion flux topography.

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Pulsed I-Pvd of Dielectric Nanodot Arrays Using a Nanoporous Template

Investigation of A Plasma-Etching Process That Uses A Porous Dielectric Template

Templated I‐pvd of Metallic Nanodot Arrays

Physiochemical Coupled Dynamic Nanosphere Lithography Enabling Multiple Metastructures from Single Mask

Ion Current Distribution During Deposition of Dielectric Material Using an Insulating Porous Alumina Template

Nanopore Processing in Dielectric Materials and Dielectric Template-Assisted Nanoarray Synthesis: Using Pulsed Bias to Enhance Process Throughput and Precision

Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching

Control of deposition channels in nanosphere templates for high-density nanodot array production

Advanced Etching Techniques of LiNbO3 Nanodevices

Nanosphere Lithography from Template-Directed Colloidal Sphere Assemblies

Method for Fabricating Micro/Nanostructures Via Scanning Probe Microscope and Anisotropic Wet Etching

Quantitative simulation of ion-beam induced deposition of nanostructures

Three-Dimensional Simulation of DRIE Process Based on the Narrow Band Level Set and Monte Carlo Method

Fabrication of Nano-Aperture Hollow Tip Array for Microplasma Etching

Nanosphere lithography on silicon oxide for high aspect ratio cryo etching of vertically-align silicon structures

A process study of electron beam nano-lithography and deep etching with an ICP system

Inductively Coupled Plasma etching of amorphous silicon nanostructures over nanotopography using C4F8/SF6 chemistry

Unconventional Lithography for Patterned Nanomaterials

Flux based modeling and simulation of dry etching for fabrication of silicon deep trench structures