Analysis of Dual-Phase-lag Thermal Behaviour in Layered Films with Temperature-Dependent Interface Thermal Resistance

KC Liu
DOI: https://doi.org/10.1088/0022-3727/38/19/022
2005-01-01
Journal of Physics D Applied Physics
Abstract:This work analyses theoretically the dual-phase-lag thermal behaviour in two-layered thin films with an interface thermal resistance, which is predicted by the radiation boundary condition model. The effect of the interface thermal resistance on the transmission–reflection phenomenon, induced by a pulsed volumetric source adjacent to the exterior surface of one layer, is investigated. Due to the difference between the two layers in the relaxation times, τq and τT, and the nonlinearity of the interfacial boundary condition, complexity is introduced and some mathematical difficulties are involved in solving the present problem. A hybrid application of the Laplace transform method and a control-volume formulation are used along with the linearization technique. The results show that the effect of the thermophysical properties on the behaviour of the energy passing across the interface gradually reduces with increasing interface thermal resistance. The lagging thermal behaviour depends on the magnitude of τT and τq more than on the ratio of τT/τq.
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