Research on Dual-Layer Passivation Films of the Crystalline Silicon Solar Cell

Li Xiang,Geng Huijuan,Zhang Yafei
DOI: https://doi.org/10.3969/j.issn.1671-4776.2012.08.002
2012-01-01
Abstract:The further improvement for the productivity of the surface passivation coating was investigated in single-junction solar cells based on p-type crystalline silicon wafers.The good passivation effect of silicon nitride(SiNx) and cheap titanium dioxide(TiO2) film were considered to reduce the thickness influence of SiNx film on the minority carrier lifetime.The SiNx film was firstly deposited on the surface of the monocrystalline silicon using the PECVD process,and then TiO2 was deposited using the thermal spraying process.The performances of solar cells before and after the thermal spraying deposition of the TiO2 film were compared.It is found that the minority carrier lifetime enhances obviously after adding the TiO2 film on the SiNx film,the reaso-nable explanation may be that the fixed positive charges exist in the TiO2 film.The optical and electrical properties of the encapsulated solar cells using the double-layer structure were improved.The results provide an important reference for further improving the performance of solar cells.
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