Synthesis and Charaterization of Silicon-Substituted Hydroxyapatite Coating by Electrochemical Deposition on Ti Substrate

LI Deng-Hu,LIN Jun,LIN Dong-Yang,WANG Xiao-Xiang
2011-01-01
Chinese journal of inorganic chemistry
Abstract:Silicon-substituted hydroxyapaptite coatings were prepared on titanium substrate with electrochemical deposition technique in electrolytes containing Ca2+, PO43- and SiO32- ions. The deposition was all conducted at a constant voltage of 3.0 V for 1 h at 85 degrees C. The as-prepared coatings were examined by inductively coupled plasma (ICP), X-ray diffraction(XRD), stylus profiler(SP), Fourier transform infrared spectroscopy(FTIR), field-emission-type scanning electron microscope (SEM). The results show that the silicon amount in Si-HA coatings deposited by electrochemical method can reach to a saturation level of around 0.55wt%, and the substitution of silicate for phosphate in the form of SiO44- results in loss of some OH- to maintain the charge balance. Additionally, the presence of silicon ions in electrolytes inhibits HA crystals growth in coatings, leading to decrease of coating thickness and transformation of rod-like crystals into dendritic crystals in the electrolyte of 20% molar ratio silicon.
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